By Peter W. Hawkes

ISBN-10: 0128002654

ISBN-13: 9780128002650

Advances in Imaging & Electron Physics merges long-running serials-Advances in Electronics & Electron Physics and Advances in Optical & Electron Microscopy. The sequence positive factors prolonged articles at the physics of electron units (especially semiconductor devices), particle optics at low and high energies, microlithography, snapshot technological know-how and electronic picture processing, electromagnetic wave propagation, electron microscopy, and the computing tools utilized in these types of domains.

  • Contributions from top specialists
  • Informs and updates on all of the most modern advancements within the field

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5. 1. 1. 2. 3. 2. 1. 2. 3. 3. 1. 2. Is SNR a Good Tool to Estimate Image Quality? 3. Another Way to Compare the Denoising Efficiency of Linear and Logarithmic Wavelets 6. Conclusion 7. Main Notations Acknowledgments References 80 80 80 81 81 83 83 84 86 86 87 89 90 94 95 96 96 1. INTRODUCTION This scientific study is focused on the concept of logarithmic wavelets in the context of a logarithmic image processing tool named the LIP model. In recent scientific works, the symmetric logarithmic image processing model (S-LIP model), as an extension of the LIP model, has been the opportunity of a publication (Navarro, Deng, & Courbebaisse 2013) that highlighted its relevance when applying a gradient operator to a digital image.

It is the change in the SE IMFP (causing an increase in dm across each transition metal series) which dominates over the change in the work function (which causes a decrease in dm over each TM series). Indeed, if one were to cause SEE much closer to the surface, then the work function effect would dominate. This can be seen in the results of Kudo, Sakai, and Ichinokawa (2000), who looked at SEE from Ar ion–bombarded surfaces. Cazaux (2010) discussed the important role of the work function in SEE, but it seems clear that in the case of transition metals, the SE IMFP is the more dominant effect in electron-excited SEE.

The reason for the higher experimental values of h could be due to the fact that SEs contribute to the BSE signal in these cases. Considering Figure 1, evidently many SEs are generated above the 50 eV threshold that is normally considered as the boundary between SE and BSE signals. As the PE beam energy is reduced, h reduces, whereas the SE yield, d, increases. Hence, it is at a low-PE beam energy that one would expect to see a significant contribution to the BSE signal from SEs, as seems to be the case in Figure 8.

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Advances in Imaging and Electron Physics, Volume 183 by Peter W. Hawkes

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